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Volumn 572, Issue , 1999, Pages 167-172
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Characterization of thick 4H-SiC hot-wall CVD layers
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Author keywords
[No Author keywords available]
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Indexed keywords
CAPACITANCE MEASUREMENT;
CHEMICAL VAPOR DEPOSITION;
ELECTRON TRANSITIONS;
EPITAXIAL GROWTH;
HYDROGEN BONDS;
POWER ELECTRONICS;
SECONDARY ION MASS SPECTROMETRY;
SEMICONDUCTOR DOPING;
SILICON CARBIDE;
SURFACES;
TEMPERATURE;
VOLTAGE MEASUREMENT;
CAPACITANCE VOLTAGE MEASUREMENT;
HOT WALL CHEMICAL VAPOR DEPOSITION SYSTEM;
TRIMETHYL ALUMINUM;
SEMICONDUCTING SILICON COMPOUNDS;
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EID: 0033335166
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-572-167 Document Type: Conference Paper |
Times cited : (8)
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References (11)
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