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Volumn 572, Issue , 1999, Pages 167-172

Characterization of thick 4H-SiC hot-wall CVD layers

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE MEASUREMENT; CHEMICAL VAPOR DEPOSITION; ELECTRON TRANSITIONS; EPITAXIAL GROWTH; HYDROGEN BONDS; POWER ELECTRONICS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DOPING; SILICON CARBIDE; SURFACES; TEMPERATURE; VOLTAGE MEASUREMENT;

EID: 0033335166     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-572-167     Document Type: Conference Paper
Times cited : (8)

References (11)
  • 11
    • 33751143238 scopus 로고    scopus 로고
    • Rensselaer Polytechnic Institute, private communication
    • Paul Chow, Rensselaer Polytechnic Institute, private communication.
    • Chow, P.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.