Highly accurate process proximity correction based on empirical model for 0.18 μm generation and beyond

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 12 B, 1999, Pages 6957-6962

  Kotani, Toshiya ^a   Tanaka, Satoshi ^a   Yamamoto, Kazuko ^a   Kobayashi, Sachiko ^a   Uno, Taiga ^a   Inoue, Soichi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Correction accuracy; Empirical model; Multiple Gaussian convolution; Process proximity correction; Process proximity effects; Proximity region

Indexed keywords

COMPUTER SIMULATION; CONVOLUTION; ERROR CORRECTION; ETCHING; MASKS; MATHEMATICAL MODELS; STATISTICAL METHODS;

MULTIPLE GAUSSIAN CONVOLUTION; PROCESS PROXIMITY CORRECTION (PPC);

NANOTECHNOLOGY;

EID: 0033319953     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.6957     Document Type: Article

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