Applications of enhanced optical proximity correction models

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 234-244

  Zhao, Jack Q ^a   Garofalo, Joseph G ^a   Blatchford, James W ^a   Ehrlacher, Edward ^a   Nease, Ellis ^a  

^a NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GAUSSIAN DIFFUSION; IMAGE ENERGY; LARGE AREAS; MODEL PARAMETERS; PROXIMITY CORRECTIONS; PROXIMITY EFFECTS; RULE-BASED; SATURATION EFFECTS; VERIFICATION TECHNIQUES;

MODEL STRUCTURES;

EID: 0011609219     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310753     Document Type: Conference Paper

References (3)

1. J. Garofalo, J. DeMarco, J. Bailey, J. Xiao, S. Vaidya, "Reduction of ASIC Gate-level Line-end Shortening by Mask Compensation", Optical/Laser Microlithography VIII, T. Brunner, Ed., SPIE Vol. 2440, 171-183, 1995.
2. J. Garofalo, G. P. Watson, L. Trimble, R. Cirelli, A. Colina, I. Grodensky, B. Herrero, A. Dunbar, F. Peiffer, R. Takahashi, R. Tarascon, W. Yarbrough, and L. Zych, "Lithography Tricks and Tribulations", 16th Annual Symposium on Photomask Technology and Management, Optical/Laser Microlithography, G. V. Sheldon and J. A. Reynolds, Ed. SPIE Vol. 2884, 311-322, 1996.
3. O. Otto, J. Garofalo, K. K. Low, C. M. Yuan, R. C. Henderson, C. Pierrat, R. L. Kostelak, S. Vaidya, and P. K. Vasudev, "Automated Optical Proximity Correction: A Rule-based Approach", Optical/Laser Microlithography, SPIE Vol. 2197, 278-293, 1994.