Large-area optical proximity correction with a combination of rule-based and simulation-based methods

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 12 SUPPL. B, 1996, Pages 6370-6373

  Miyama, Sachiko ^a   Yamamoto, Kazuko ^a   Koyama, Kiyomi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

CD uniformity; DOF; Gate; OPC; Optical lithography; Rule based; Simulation based

Indexed keywords

EID: 0011193312     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.6370     Document Type: Article

References (5)

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