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Volumn 38, Issue 12 B, 1999, Pages 7013-7016

Development of a 2 kHz F2 laser for 157 nm lithography

Author keywords

157 nm; F2; Lithography; Molecular fluorine laser; Post ArF; VUV

Indexed keywords

PHOTOLITHOGRAPHY; PULSED LASER APPLICATIONS;

EID: 0033316165     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.7013     Document Type: Article
Times cited : (10)

References (15)
  • 4
    • 33645045606 scopus 로고    scopus 로고
    • Lambda Highlights No. 51, by Lambda Physik GmbH, March (1997)
    • Lambda Highlights No. 51, by Lambda Physik GmbH, March (1997).
  • 13
    • 33645040439 scopus 로고    scopus 로고
    • private communication
    • A. Takahashi: private communication.
    • Takahashi, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.