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Volumn 38, Issue 12 B, 1999, Pages 7013-7016
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Development of a 2 kHz F2 laser for 157 nm lithography
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Author keywords
157 nm; F2; Lithography; Molecular fluorine laser; Post ArF; VUV
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Indexed keywords
PHOTOLITHOGRAPHY;
PULSED LASER APPLICATIONS;
MOLECULAR FLUORINE LASERS;
NANOTECHNOLOGY;
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EID: 0033316165
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.38.7013 Document Type: Article |
Times cited : (10)
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References (15)
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