Characteristics of deep UV optics at 193 nm & 157 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3578, Issue , 1999, Pages 45-53

  Callahan, Glen P ^a   Flint, Bruce K ^a  

^a Acton Research Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; BANDPASS FILTERS; ELECTROMAGNETIC WAVE ATTENUATION; EXCIMER LASERS; LASER DAMAGE; OPTICAL BEAM SPLITTERS; OPTICAL FILTERS; PHOTOLITHOGRAPHY; REFLECTIVE COATINGS; THIN FILMS; ULTRAVIOLET RADIATION;

DEEP ULTRAVIOLET OPTICAL MATERIALS; FLUORINE LASERS;

OPTICAL FILMS;

EID: 0032642479     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (7)