Stress in hydrogenated microcrystalline silicon thin films

Materials Research Society Symposium - Proceedings

Volumn 557, Issue , 1999, Pages 537-542

  Peiro, D ^a   Voz, C ^a   Bertomeu, J ^a   Andreu, J ^a   Martinez, E ^a   Esteve, J ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; HARDNESS; HYDROGEN; HYDROGENATION; PHASE TRANSITIONS; RAMAN SPECTROSCOPY; RESIDUAL STRESSES; SILANES; SILICON WAFERS; VOLUME FRACTION; X RAY DIFFRACTION ANALYSIS;

HYDROGENATED MICROCRYSTALLINE SILICON FILMS; MONOCRYSTALLINE WAFERS; NANOINDENTATION;

THIN FILMS;

EID: 0033297423     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-557-537     Document Type: Article

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