Stress measurements in polycrystalline silicon films grown by hot-wire chemical vapor deposition

Materials Letters

Volumn 30, Issue 2-3, 1997, Pages 239-243

  Peiro D ^a   Bertomeu, J ^a   Arrando, F ^a   Andreu, J ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

Author keywords

Hot wire CVD; Polycrystalline silicon; Residual stress

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DEPOSITION; FILM GROWTH; MECHANICAL VARIABLES MEASUREMENT; OXIDATION; POLYCRYSTALLINE MATERIALS; RESIDUAL STRESSES; SEMICONDUCTING SILICON; X RAY POWDER DIFFRACTION;

HOT WIRE CHEMICAL VAPOR DEPOSITION; POST DEPOSITION OXIDATION;

SEMICONDUCTING FILMS;

EID: 0031076268     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(96)00197-8     Document Type: Article

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