Liquid-phase deposition of silicon-dioxide films using tetra-ethyl orthosilicate

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 37, Issue 1 PART A/B, 1998, Pages

  Usami, Koh Ichi ^a   Hayashi, Shin ^a   Uchida, Yasutaka ^b   Matsumura, Masakiyo ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b TEIKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Liquid phase deposition; Passivation layer; Silicon dioxide; TEOS; Tetra ethyl orthosilicate

Indexed keywords

AMMONIA; DEHYDRATION; FILMS; HYDROLYSIS; PASSIVATION; PHYSICAL PROPERTIES; SILICA; SILICON; STOICHIOMETRY; WATER;

LIQUID PHASE DEPOSITION; SILICON DIOXIDE FILM; TETRA ETHYL ORTHOSILICATE;

DEPOSITION;

EID: 0031676334     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.l97     Document Type: Article

References (6)

1. H. Nagayama, H. Honda and H. Kawahara: J. Electrochem Soc. 135 (1988) 2013.
2. T. Homma, T. Katoh, Y. Yamada and Y. Murao: J. Electrochem. Soc. 140 (1993) 2410.
3. J. Chou and S. Lee: IEEE Trans. Electron Devices 43 (1996) 599.
4. M. Kitaoka, H. Honda, Y. Yoshida, A. Takagawa and H. Kawahara: 1991 Int Conf. on Thin Film Physics and Applications , 1991, p. 109.
5. N. D. Young, D. J. McCulloch and R. M. Bunn: 1997 Int Workshop on Active-Matrix Liquid-Crystal Displays, 1997, p. 47.
6. W. Gassser, Y. Uchida and M. Matsumura: Thin Solid Films 250 (1994) 213.