Dynamic analysis of a SCALPEL mask during electron-beam exposure

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3587-3591

  Semke, W H ^a   Engelstad, R L ^a   Lovell, E G ^a   Liddle, J A ^b  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010450565     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590311     Document Type: Article

References (2)

1. L. R. Harriot, J. Vac. Sci. Technol. B 15, 2130 (1997).
2. D. L. Laird and R. L. Engelstad, Microelectron. Eng. 35, 531 (1997).