Refractive index change during exposure for 193 nm chemically amplified resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 643-650

  Oh, Hye Keun ^a   Sohn, Young Soo ^a   Sung, Moon Gyu ^a   Lee, Young Mi ^a   Lee, Eun Mi ^a   Byun, Sung Hwan ^a   An, Ilsin ^a   Lee, Kun Sang ^a   Park, In Ho ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; EXCIMER LASERS; LIGHT TRANSMISSION; REFRACTIVE INDEX; RESINS;

CHEMICALLY AMPLIFIED RESISTS (CAR);

PHOTORESISTS;

EID: 0032628396     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (7)