Exposure effects on deep ultraviolet resist thickness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 814-819

  Baluswamy, Pary ^a   Glass, Thomas R ^a  

^a MICRON TECHNOLOGY INC   (United States)

Author keywords

DUV resist; Exposure; Lithography

Indexed keywords

DEEP ULTRA VIOLET (DUV); DUV RESIST; EXPOSURE; EXPOSURE EFFECTS; LITHOGRAPHY; RESIST MODELS; RESIST THICKNESSES;

ELECTRON BEAM LITHOGRAPHY;

EID: 29244451984     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310815     Document Type: Conference Paper

References (8)

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