Wafer chuck for magnification correction in x-ray lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3476-3479

  Feldman, M ^a   Smith, D ^b  

^a LOUISIANA STATE UNIVERSITY   (United States)

^b Rimkus Consulting Group Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000952569     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590480     Document Type: Article

References (5)

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2. J. P. Silverman, J. Vac. Sci. Technol. B 15, 2117 (1997).
3. A. Chen and J. Silverman, Proc. SPIE 2437, 140 (1995).
4. 4V. DiMilia and J. M. Warlaumont, US Patent no. 5,155,749 (October 13, 1992).
5. K.-H. Muller, K. Brehm, and K. Werner, J. Vac. Sci. Technol. B 6, 2139 (1988).