Ultra-thin gate oxide grown on nitrogen implanted silicon

Journal of the Korean Physical Society

Volumn 35, Issue SUPPL. 4, 1999, Pages

  Nam, In Ho ^a   Hong, Sung In ^a   Sim, Jae Sung ^a   Park, Byung Gook ^a   Lee, Jong Duk ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033262263     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (9)

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