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Volumn 48, Issue 1, 1999, Pages 231-234

Ion beam synthesis of narrow Ge nanocluster bands in thin SiO2 films

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; INTERFACES (MATERIALS); ION BOMBARDMENT; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR GROWTH; SILICA; SYNTHESIS (CHEMICAL); THIN FILMS;

EID: 0033190151     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00377-9     Document Type: Article
Times cited : (26)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.