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Volumn 9 I, Issue 8, 1999, Pages
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Atomic layer doping of SiGe
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Author keywords
[No Author keywords available]
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Indexed keywords
ACTIVATION ENERGY;
ADSORPTION;
BORON;
CHEMICAL VAPOR DEPOSITION;
DESORPTION;
DOPING (ADDITIVES);
EPITAXIAL GROWTH;
HYDROGEN;
MONOLAYERS;
PARTIAL PRESSURE;
PHOSPHORUS;
TEMPERATURE;
ATOMIC LAYER DOPING;
DIBORANE;
METHYLSILANE;
PHOSPHINE;
SELF LIMITING;
SILICON COMPOUNDS;
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EID: 0033188003
PISSN: 11554339
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1051/jp4:1999836 Document Type: Article |
Times cited : (1)
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References (15)
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