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Volumn 9 I, Issue 8, 1999, Pages

Atomic layer doping of SiGe

(1)  Tillack, B a  

a IHP   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ADSORPTION; BORON; CHEMICAL VAPOR DEPOSITION; DESORPTION; DOPING (ADDITIVES); EPITAXIAL GROWTH; HYDROGEN; MONOLAYERS; PARTIAL PRESSURE; PHOSPHORUS; TEMPERATURE;

EID: 0033188003     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:1999836     Document Type: Article
Times cited : (1)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.