Mechanical stress in thin SiO2 and Ta2O5 films produced by reactive-low-voltage-ion-plating (RLVIP)

Journal of Non-Crystalline Solids

Volumn 218, Issue , 1997, Pages 256-261

  Strauss, Georg N ^a   Danh, Nguyen Quang ^a   Pulker, H K ^a,b  

^a UNIVERSITY OF INNSBRUCK   (Austria)

^b Balzers AG   (Liechtenstein)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; DEPOSITION; GLASS; SILICA; STOICHIOMETRY; STRESS ANALYSIS; SUBSTRATES; TANTALUM COMPOUNDS; THIN FILMS;

COMPRESSIVE STRESSES; REACTIVE LOW VOLTAGE ION PLATING (RLVIP);

CONDUCTIVE FILMS;

EID: 0031549381     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(97)00167-1     Document Type: Article

References (8)

1. H.K. Pulker, J. Edlinger, M. Buehler, in: Proc. Int. Symp. on Trends and New Applications in Thin Films, Strasbourg, 1987, Vol. II, Suppl. Rev. Le Vide, Les Couches Minces, Jan/Feb, Vol. 235, 1987, p. 741.
2. H.K. Pulker, Coating on Glass (Elsevier, Amsterdam, 1984) ch. 8.
3. P.J. Martin, R.P. Netterfield, 'Optical film produced by ion based techniques', in: Progress in Optics XXIII, ed. E. Wolf (Elsevier, Amsterdam, 1986).
4. J. Edlinger, thesis, Reaktives Niederspannungs-Ionenplattieren, eine Untersuchung des Verfahrens und der erhaltenen Schichten, University of Innsbruck - Inst, of Experimental Physics (1990).
5. D.M. Mattox, G.J. Kominiak, J. Vac. Sci. Technol. 9 (1972) 528.
6. G. Carter, J. Phys. D27 (1994) 1046.
7. W. Lindinger, Pure Appl. Chem. 57 (1985) 1223.
8. H.K. Pulker, J. Vac. Sci. Technol. A10 (1992) 1669.