Mechanical properties of dielectric thin films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3133, Issue , 1997, Pages 176-182

  Rigneault, H ^a   Mahodaux, C ^a   Giovannini, H ^a   Escoubas, L ^a   Morreti, P ^a  

^a Ecole Centrale Marseille   (France)

Author keywords

Annealing; Implantation; Reactive Low Voltage Ion Plating; Stress; Ta2O5; Thin film

Indexed keywords

ANNEALING; ATMOSPHERIC TEMPERATURE; DIELECTRIC FILMS; HELIUM; ION IMPLANTATION; LIGHT ABSORPTION; OPTICAL MULTILAYERS; SILICA; STRESS ANALYSIS; TANTALUM COMPOUNDS; XENON;

REACTIVE LOW-VOLTAGE ION PLATING (RLVIP);

THIN FILMS;

EID: 0031289284     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.290191     Document Type: Conference Paper

References (9)

1. Stresses and deformation processes in thin films on substartes
2. An intrinsic stress scaling for polycristalline thin films prepared by ion beam sputtering
3. Kinetics of residual stress evolution in evaporated silicon dioxide films exposed to room air
4. Elastic relationship in layered media with approximation for the case of thin films on a thick substrate
5. Guided wave characterization techniques for the comparison of properties of different optical coatings
6. Characterization of absorption by photothermal deflection