Effects of thermal annealing on ion beam sputtered SiO2 and TiO2 optical thin films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3133, Issue , 1997, Pages 163-175

  Tilsch, Markus ^a   Scheuer, Volker ^a   Tschudi, Theo ^a  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Density; Ion beam sputtering; Optical absorption; Optical thin films; Postannealing; Refractive index; Scatter light; SiO2; Stress; TiO2

Indexed keywords

ANNEALING; CRYSTAL GROWTH; DENSITY (OPTICAL); ION BEAMS; LIGHT ABSORPTION; LIGHT EXTINCTION; LIGHT SCATTERING; MULTILAYERS; OPTICAL PROPERTIES; REFRACTIVE INDEX; SILICA; SPUTTERING; STRESS ANALYSIS; THICKNESS CONTROL; THIN FILMS; TITANIUM OXIDES;

ION BEAM SPUTTERING; OPTICAL THIN FILMS;

OPTICAL FILMS;

EID: 0031289350     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.279104     Document Type: Conference Paper

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