Growth mechanism of PbTiO3 films by metal organic chemical vapor deposition from Pb(DPM)2, Ti(DPM)2(i-OPr)2 and O2

Journal of Materials Science Letters

Volumn 17, Issue 19, 1998, Pages 1653-1655

  Nishioka, K ^a   Murayama, S ^a   Osawa, T ^a   Egashira, Y ^a   Komiyama, H ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; FERROELECTRIC MATERIALS; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NUMERICAL METHODS; REACTION KINETICS; STOICHIOMETRY; X RAY DIFFRACTION ANALYSIS;

LEAD DIPIVALOYLMETHANATO; LEAD TITANATE;

SEMICONDUCTING LEAD COMPOUNDS;

EID: 0032178251     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1006650229131     Document Type: Article

References (8)

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