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Volumn 145, Issue 3, 1998, Pages 1070-1075
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The effects of gas-phase additives NH3, NO, and NO2 on SiH4/O2 chemical vapor deposition
a,c a a b |
Author keywords
[No Author keywords available]
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Indexed keywords
AMMONIA;
CHEMICAL REACTORS;
COMPUTER SIMULATION;
NITROGEN OXIDES;
OXYGEN;
SILANES;
SILICA;
ROUGH FILMS;
TUBULAR REACTORS;
CHEMICAL VAPOR DEPOSITION;
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EID: 0032025457
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1838391 Document Type: Article |
Times cited : (6)
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References (15)
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