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Volumn 145, Issue 3, 1998, Pages 1070-1075

The effects of gas-phase additives NH3, NO, and NO2 on SiH4/O2 chemical vapor deposition

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; CHEMICAL REACTORS; COMPUTER SIMULATION; NITROGEN OXIDES; OXYGEN; SILANES; SILICA;

EID: 0032025457     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838391     Document Type: Article
Times cited : (6)

References (15)
  • 10
    • 11644304664 scopus 로고    scopus 로고
    • Private communication
    • M. Koshi, Private communication.
    • Koshi, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.