Decreasing the optical path length in an optoelectronic module using silicon micromachining

Journal of Micromechanics and Microengineering

Volumn 9, Issue 2, 1999, Pages 127-129

  Richard, Åse ^a   Rangsten, Pelle ^a   Strandman, Carola ^a   Bäcklund, Ylva ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; ELECTRODEPOSITION; INTEGRATED OPTOELECTRONICS; MICROMACHINING; MIRRORS; PHOTORESISTS; SEMICONDUCTING SILICON;

DICING; OPTICAL PATH LENGTH; OPTOELECTRONIC MODULE; SILICON MICROMACHINING; SILICON MIRRORS;

INTEGRATED CIRCUIT LAYOUT;

EID: 0033138339     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/9/2/006     Document Type: Article

References (6)

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2. Shipley PEPR 2400 Process Manual (Coventry: Shipley)
3. Heschel M and Bouwstra S Conformal coating by photoresist of sharp corners of anisotropically etched through-holes in silicon Proc. Transducers '97 (Chicago, USA) pp 209-12
4. Shmulovich J, Gates J V, Kane C F, Cappuzzo M A and Szalkowski J M Successful development of non-planar lithography for micromachining applications Integrated Photonics Research Tech. Dig. (Boston USA, 1996) vol 6 pp 354-7
5. Kersten P, Bouwstra S and Petersen J W 1995 Photolithography on micromachined 3D surfaces using electrodeposited photoresist Sensors Actuators A 51 51-4
6. Linder S, Baltes H, Gnaedinger F and Doering E Photolithography in anisotropically etched grooves Proc. IEEE 9th Annu. Int. Workshop on Micro Electro Mechanical Systems (San Diego, USA, 1996) pp 38-43