Conformal coating by photoresist of sharp corners of anisotropically etched through-holes in silicon

International Conference on Solid-State Sensors and Actuators, Proceedings

Volumn 1, Issue , 1997, Pages 209-212

  Heschel, Matthias ^a   Bouwstra, Siebe ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

COATING TECHNIQUES; ELECTRODEPOSITION; ETCHING; PHOTORESISTS;

CONFORMAL COATING;

MICROELECTRONIC PROCESSING;

EID: 0030659907     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)