Silicon membrane nanofilters from sacrificial oxide removal

Journal of Microelectromechanical Systems

Volumn 8, Issue 1, 1999, Pages 34-42

  Chu, Wen Hwa ^a,b,f   Chin, Ruby ^c   Huen, Tony ^a,d,g   Ferrari, Mauro ^e  

^a IEEE   (United States)

^b TEXAS INSTRUMENTS   (United States)

^c 109 McLaughlin Hall   (United States)

^d UNIVERSITY OF CALIFORNIA   (United States)

^e OHIO STATE UNIVERSITY   (United States)

^f AAAS   (United States)

^g UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Microfilter; Nanofilter; Sacrificial oxide

Indexed keywords

ELECTRIC FILTERS; MEMBRANES; MICROMACHINING; NANOTECHNOLOGY; PORE SIZE; SILICON;

SACRIFICIAL LAYER FILTERS (SLF); SACRIFICIAL OXIDE REMOVAL; SILICON MEMBRANE NANOFILTERS;

MICROELECTROMECHANICAL DEVICES;

EID: 0033101198     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.749400     Document Type: Article

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