Migration process of an Al adatom on the Si(111) surface

Surface Science

Volumn 423, Issue 1, 1999, Pages 117-126

  Hoshino, T ^a   Okano, K ^a   Enomoto, N ^a   Hata, M ^a   Tsuda, M ^a  

^a CHIBA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ADSORPTION; ALUMINUM; COMPUTATIONAL METHODS; CRYSTAL ORIENTATION; DIFFUSION IN SOLIDS; POTENTIAL ENERGY; QUANTUM THEORY; SINGLE CRYSTALS; SURFACE CHEMISTRY; SURFACE STRUCTURE;

ADATOMS; DENSITY FUNCTIONAL THEORY (DFT); QUANTUM CHEMISTRY;

SILICON;

EID: 0033099173     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(98)00921-2     Document Type: Article

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