Critical oxide cluster size on Si(111)

Surface Science

Volumn 423, Issue 1, 1999, Pages 61-69

  Shklyaev, A A ^a   Aono, M ^a   Suzuki, T ^a  

^a INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CRYSTAL ORIENTATION; DECOMPOSITION; DESORPTION; NONLINEAR OPTICS; NUCLEATION; OXIDATION; PRESSURE EFFECTS; REACTION KINETICS; SECOND HARMONIC GENERATION; SURFACE CHEMISTRY; SURFACE STRUCTURE;

SCALING RELATIONSHIP;

SILICON;

EID: 0033097833     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(98)00895-4     Document Type: Article

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