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Volumn 357-358, Issue , 1996, Pages 729-732
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Kinetics of initial oxidation of the Si(111)-7 × 7 surface near the critical conditions
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Author keywords
Adhesion; Chemisorption; Etching; Oxidation; Oxygen; Second harmonic generation; Silicon; Surface chemical reaction
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Indexed keywords
CHEMISORPTION;
CRYSTAL GROWTH;
ETCHING;
NUCLEATION;
OXIDATION;
OXIDES;
PRESSURE EFFECTS;
REACTION KINETICS;
SECOND HARMONIC GENERATION;
SEMICONDUCTING SILICON;
SURFACE PROPERTIES;
TEMPERATURE;
INITIAL OXIDATION;
INITIAL REACTIVE STICKING COEFFICIENT;
OXIDE GROWTH;
OXIDE NUCLEATION;
REACTION RATE CONSTANTS;
SILICON SURFACE;
SURFACE TEMPERATURES;
SURFACE PHENOMENA;
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EID: 0030164717
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/0039-6028(96)00254-3 Document Type: Article |
Times cited : (5)
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References (20)
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