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Volumn 357-358, Issue , 1996, Pages 729-732

Kinetics of initial oxidation of the Si(111)-7 × 7 surface near the critical conditions

Author keywords

Adhesion; Chemisorption; Etching; Oxidation; Oxygen; Second harmonic generation; Silicon; Surface chemical reaction

Indexed keywords

CHEMISORPTION; CRYSTAL GROWTH; ETCHING; NUCLEATION; OXIDATION; OXIDES; PRESSURE EFFECTS; REACTION KINETICS; SECOND HARMONIC GENERATION; SEMICONDUCTING SILICON; SURFACE PROPERTIES; TEMPERATURE;

EID: 0030164717     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(96)00254-3     Document Type: Article
Times cited : (5)

References (20)
  • 9
    • 6744248168 scopus 로고
    • Y.R. Shen, Nature 337 (1989) 519.
    • (1989) Nature , vol.337 , pp. 519
    • Shen, Y.R.1
  • 19
    • 85136564863 scopus 로고    scopus 로고
    • note
    • tr were shifted by ∼30°C in Fig. 4 because of the different calibration of absolute temperature: the temperature of the 7×7↔1×1 phase transition was observed at 860°C in Refs. [6,7], and at 830°C in the present work by the infrared pyrometer.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.