Structural properties of microcrystalline silicon-germanium films

Philosophical Magazine Letters

Volumn 79, Issue 2, 1999, Pages 71-78

  Houben, L ^a   Carius, R ^a   Lundszien, D ^a   Folsch J ^a   Finger, F ^a   Luysberg, M ^a   Wagner, H ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CRYSTAL MICROSTRUCTURE; CRYSTALLINE MATERIALS; CRYSTALLIZATION; FILM PREPARATION; HYDROGENATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; THERMOANALYSIS; TRANSMISSION ELECTRON MICROSCOPY; X RAY CRYSTALLOGRAPHY;

MICROCRYSTALLINE SILICON-GERMANIUM FILMS; THERMAL CRYSTALLIZATION;

SEMICONDUCTING FILMS;

EID: 0033078071     PISSN: 09500839     EISSN: 13623036     Source Type: Journal    
DOI: 10.1080/095008399177561     Document Type: Article

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