Deposition of microcrystalline hydrogenated silicon,germanium alloy (μc-SixGe1-x:H) films by reactive magnetron sputtering (RMS)

Journal of Non-Crystalline Solids

Volumn 198-200, Issue PART 1, 1996, Pages 587-591

  Cho, S M ^a   Christensen, C ^a   Lucovsky, G ^a   Maher, D M ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; ANNEALING; ARGON; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; MICROSTRUCTURE; PHASE TRANSITIONS; RAMAN SCATTERING; SILICON ALLOYS; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

MICROCRYSTALLINE HYDROGENATED SILICON GERMANIUM ALLOY; MICROSTRUCTURAL CHANGES; POLYCRYSTALLINE MICROSTRUCTURE; REACTIVE MAGNETRON SPUTTERING;

AMORPHOUS FILMS;

EID: 0030563425     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-3093(95)00768-7     Document Type: Article

References (7)

1. J.C. Sturm, E.J. Prinz and C.W. Magee, IEEE Electron Device Lett. 12 (1991) 303.
2. T.L. Lin, T. George, E.W. Jones, A. Ksenzov and M.L. Huberman, Appl. Phys. Lett. 60 (1992) 380.
3. S.M. Cho, D. Wolfe, S.S. He and G. Lucovsky, Mater. Res. Soc. Symp. Proc. 358 (1994) 781.
4. R.A. Rudder, J.W Cook and G. Lucovsky, Appl. Phys. Lett. 43 (1983) 871; Appl. Phys. Lett. 45 (1984) 887.
5. R.A. Rudder, J.W Cook and G. Lucovsky, Appl. Phys. Lett. 43 (1983) 871; Appl. Phys. Lett. 45 (1984) 887.
6. N.J. Shevchik, J.S. Lannin and J. Tejeda, Phys. Rev. B7 (1973) 3987.
7. C. Wang, PhD thesis, North Carolina State University (1991).