X-ray reflection from self-organized interfaces in an SiGe/Si multilayer

Semiconductor Science and Technology

Volumn 14, Issue 1, 1999, Pages 32-40

  Grim, J ^a   Holy V ^a   Kubena J ^a   Darhuber, A A ^b   Zerlauth, S ^b   Bauer, G ^b  

^a MASARYK UNIVERSITY   (Czech Republic)

^b JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; COMPUTER SIMULATION; DIFFRACTOMETERS; ELECTROMAGNETIC WAVE REFLECTION; ELECTROMAGNETIC WAVE SCATTERING; MULTILAYERS; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR JUNCTIONS; TRANSMISSION ELECTRON MICROSCOPY; X RAY ANALYSIS;

DISTORTED-WAVE BORN APPROXIMATION; HIGH-RESOLUTION X RAY DIFFRACTOMETRY; X RAY REFLECTION;

SEMICONDUCTING FILMS;

EID: 0032755306     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/14/1/004     Document Type: Article

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