X-ray reflectivity investigations of the interface morphology in strained SiGe/Si multilayers

Semiconductor Science and Technology

Volumn 13, Issue 6, 1998, Pages 590-598

  Holy V ^a   Darhuber, A A ^b   Stangl, J ^b   Bauer, G ^b   Nutzel J ^c   Abstreiter, G ^c  

^a MASARYK UNIVERSITY   (Czech Republic)

^b JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^c WALTER SCHOTTKY INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001113714     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/13/6/009     Document Type: Article

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