Fabrication and performance of InGaAIAs MQW distributed Bragg reflector lasers with grooved surface gratings formed by reactive beam etching

IEE Proceedings: Optoelectronics

Volumn 146, Issue 1, 1999, Pages 39-43

  Oku, S ^a   Kondo, S ^a   Noguchi, Y ^a   Hirono, T ^a   Nakao, M ^a   Tamamura, T ^a  

^a Nil Opto electronics Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; ELECTROMAGNETIC WAVE DIFFRACTION; MIRRORS; REACTIVE ION ETCHING; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR GROWTH;

BRAGG REFLECTORS;

SEMICONDUCTOR QUANTUM WELLS;

EID: 0032686054     PISSN: 13502433     EISSN: None     Source Type: Journal    
DOI: 10.1049/ip-opt:19990106     Document Type: Article

References (15)

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