Properties of stacked dielectric films composed of SiO2/Si3N4/SiO2

Journal of Non-Crystalline Solids

Volumn 245, Issue 1-3, 1999, Pages 224-231

  Santucci, S ^a   Lozzi, L ^a   Passacantando, M ^a   Phani, A R ^a   Palumbo, E ^a   Bracchitta, G ^b   De Tommasis, R ^b   Torsi, A ^b   Alfonsetti, R ^b   Moccia, G ^b  

^a UNIVERSITY OF L'AQUILA   (Italy)

^b TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; DIELECTRIC PROPERTIES OF SOLIDS; ELECTRIC CURRENT MEASUREMENT; FILM GROWTH; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON NITRIDE; SILICON WAFERS; THERMOOXIDATION;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD);

DIELECTRIC FILMS;

EID: 0032674814     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00886-2     Document Type: Article

References (18)

1. F.T. Liou, S.O. Chen, IEEE Trans. Electron Devices ED-31 (1984) 1786.
2. J. Robertson, M.J. Powell, Appl. Phys. Lett. 44 (1984) 415.
3. T. Maruyama, R. Shirota, J. Appl. Phys. 78 (1995) 3912.
4. H. Tanaka, H. Uchida, T. Ajioka, N. Hirashita, IEEE Trans. Electron Devices 40 (1993) 2331.
5. E. Suzuki, K. Miura, Y. Hayashi, R.P. Tsay, D.K. Schroder, IEEE Trans. Electron Devices 36 (1989) 1145.
6. H. Tanaka, H. Uchida, N. Hirashita, T. Ajioka, in: Proceedings of the International Reliability Physics Symp., 1992. p. 31.
7. R. Alfonsetti, R. De Tommasis, F. Famà, G. Moccia, S. Santucci, M. Passacantando, Advances in X-ray Chemical Analysis Japan 26 (1995) 145.
8. Handbook of X-ray Photoelectron spectroscopy, in: J. Chastain (Ed.), Perkin-elmer corporation, Minnesota, 1992.
9. R. Alfonsetti, L. Lozzi, M. Passacantando, P. Picozzi, S. Santucci, Thin Solid Films 213 (1992) 158.
10. R. Alfonsetti, L. Lozzi, M. Passacantando, P. Picozzi, S. Santucci, Appl. Surf. Sci. 70/71 (1993) 222.
11. E. Hecht, Zajac, Optics, Addison-Wesley, New York, 1973.
12. L.G. Parrat, Phys. Rev. 95 (1954) 359.
13. L. Névot, P. Croce, Rev. Phys. Appl. 15 (1980) 761.
14. L. Lozzi, M. Passacantando, P. Picozzi, S. Santucci, G. Tomassi, R. Alfonsetti, A. Borghesi, Surf. Interface Anal. 22 (1994) 190.
15. S. Santucci, L. Lozzi, M. Passacantando, S. Di Nardo, P. Picozzi, J. Non-Cryst. Solids 216 (1997) 156.
16. S. Santucci, L. Lozzi, L. Ottaviano, M. Passacantando, P. Picozzi, G. Moccia, R. Alfonsetti, F. Famà, R. De Tommasis, J. Vac. Sci. Technol. A 15 (1997) 905.
17. S.K. Sinha, E.B. Sirota, S. Garoff, H.B. Stanley, Phys. Rev. B 38 (1988) 2297.
18. M. Vedpathak, S. Basu, S.K. Kulkarni, Appl. Phys. Lett. 115 (1997) 311.