Compositional characterization of very thin SiO2/Si3N4/SiO2 stacked films by x-ray photoemission spectroscopy and time-of-flight-secondary-ion-mass spectroscopy techniques

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 3, 1997, Pages 905-910

  Santucci, S ^a   Lozzi, L ^a   Ottaviano, L ^a   Passacantando, M ^a   Picozzi, P ^a   Moccia, G ^b   Alfonsetti, R ^b   Di Giacomo, A ^b   Fiorani, P ^b  

^a UNIVERSITY OF L'AQUILA   (Italy)

^b TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041640910     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580730     Document Type: Article

References (19)

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