SCOPUS 정보 검색 플랫폼

Volumn 568, Issue , 1999, Pages 271-276

Diffusion of phosphorus in strained Si/SiGe/Si heterostructures

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN SOLIDS; OXIDATION; PHOSPHORUS; SEMICONDUCTING BORON; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS;

INTERSTITIAL FRACTION; PAIRING-CONTROLLED MECHANISMS;

HETEROJUNCTIONS;

EID: 0032670216 PISSN: 02729172 EISSN: None Source Type: Conference Proceeding
DOI: 10.1557/proc-568-271 Document Type: Article

Times cited : (4)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.