Improvement of SrTiO3 thin film surface polished by Chemical Mechanical Planarization for HTS multilayer device

IEEE Transactions on Applied Superconductivity

Volumn 9, Issue 2 PART 3, 1999, Pages 3464-3467

  Takashima, Hiroshi ^a   Tcrada, Norio ^a   Koyanagi, Masao ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL POLISHING; CRITICAL CURRENTS; ELECTRON DEVICE MANUFACTURE; MULTILAYERS; OXIDE SUPERCONDUCTORS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; STRONTIUM COMPOUNDS; SUPERCONDUCTING FILMS; SUPERCONDUCTIVITY; SURFACE ROUGHNESS; YTTRIUM BARIUM COPPER OXIDES;

CHEMICAL MECHANICAL PLANARIZATION; CROSSOVER STRUCTURE; CRYSTALLINITY; HIGH TEMPERATURE SUPERCONDUCTOR MULTILAYER DEVICES; INSULATION RESISTIVITY; SUPERCONDUCTING PROPERTIES;

SUPERCONDUCTING DEVICES;

EID: 0032663502     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/77.783775     Document Type: Article

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