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Journal of Applied Physics

Volumn 75, Issue 2, 1994, Pages 683-702

Thin-film multilayer interconnect technology for YBa2Cu 3O7-x

(3) Wellstood, F C a,b Kingston, J J a,b Clarke, John a,b

a UNIVERSITY OF CALIFORNIA (United States)

b LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33745119364 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.356469 Document Type: Article

Times cited : (85)

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