Formation of high-density silicon dots on a silicon-on-insulator substrate

Applied Surface Science

Volumn 142, Issue 1, 1999, Pages 553-557

  Tabe, M ^a   Kumezawa, M ^a   Yamamoto, T ^a   Makita, S ^a   Yamaguchi, T ^a   Ishikawa, Y ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; NUCLEATION; OXIDATION; SEMICONDUCTING SILICON; SILICON NITRIDE; VACUUM APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

LATERAL SIZE; SILICON DOT;

SEMICONDUCTOR QUANTUM DOTS;

EID: 0032662213     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00703-X     Document Type: Article

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