Si pillar formation and height countrol by furnace oxidation of the Si (111) surface with ultra-small SiN nuclei

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 3 SUPPL. B, 1998, Pages 1576-1579

  Tabe, Michiharu ^a   Yamamoto, Takeshi ^a   Nagasawa, Tadashi ^a   Murakami, Kenji ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Atomic force microscopy; Selective oxidation of Si; Silicon nitride; Silicon nitride nucleation; Silicon pillar; X ray photoelectron spectroscopy

Indexed keywords

EID: 0000145834     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.1576     Document Type: Article

References (11)

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