Family of the metal-induced Si(111) 3 × 1 reconstructions with a top Si atom density of 4/3 monolayer

Surface Science

Volumn 426, Issue 3, 1999, Pages 298-307

  Saranin, A A ^a,b,c   Zotov, A V ^a,b,d   Lifshits, V G ^b,c,d   Katayama, M ^a   Oura, K ^a  

^a OSAKA UNIVERSITY   (Japan)

^b INSTITUTE OF AUTOMATION AND CONTROL PROCESSES   (Russian Federation)

^c FAR EASTERN FEDERAL UNIVERSITY   (Russian Federation)

^d VLADIVOSTOK STATE UNIVERSITY OF ECONOMICS AND SERVICE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ALKALI METALS; CHEMICAL BONDS; LOW ENERGY ELECTRON DIFFRACTION; MATHEMATICAL MODELS; MORPHOLOGY; PHASE TRANSITIONS; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; SILVER; SURFACE ROUGHNESS; SURFACE STRUCTURE; SURFACE TOPOGRAPHY;

ATOM DENSITY; ATOM SOLID INTERACTIONS;

SURFACE TREATMENT;

EID: 0032661651     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00283-6     Document Type: Article

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