Nanohardness and chemical bonding of boron nitride films

Thin Solid Films

Volumn 343-344, Issue 1-2, 1999, Pages 238-241

  Jankowski, Alan F ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Boron nitride; Chemical bonding; Hardness; Reactive sputtering; X ray absorption

Indexed keywords

ANNEALING; BINDING ENERGY; BORON COMPOUNDS; HARDNESS; ION IMPLANTATION; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; SPUTTER DEPOSITION;

NANOINDENTATION; NEAR-EDGE X RAY ABSORPTION FINE STRUCTURE ANALYSIS; PLANAR MAGNETRON SOURCES; REACTIVE SPUTTERING;

PROTECTIVE COATINGS;

EID: 0032661432     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01634-4     Document Type: Article

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