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Volumn 425, Issue 2, 1999, Pages 185-194
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Surface reconstruction induced by a pulsed low-energy ion beam during Si(111) molecular beam epitaxy
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Author keywords
[No Author keywords available]
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Indexed keywords
ACTIVATION ENERGY;
COMPUTER SIMULATION;
DIFFUSION;
ION BEAMS;
MOLECULAR BEAM EPITAXY;
MONTE CARLO METHODS;
MORPHOLOGY;
PHASE TRANSITIONS;
REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;
RELAXATION PROCESSES;
SEMICONDUCTING SILICON;
SINGLE CRYSTALS;
ADATOM;
ION SOLID INTERACTION;
SURFACE RECONSTRUCTION;
SURFACE RELAXATION;
SURFACE SMOOTHNESS;
SURFACE STRUCTURE;
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EID: 0032655920
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/S0039-6028(99)00176-4 Document Type: Article |
Times cited : (7)
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References (18)
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