메뉴 건너뛰기




Volumn 425, Issue 2, 1999, Pages 185-194

Surface reconstruction induced by a pulsed low-energy ion beam during Si(111) molecular beam epitaxy

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; COMPUTER SIMULATION; DIFFUSION; ION BEAMS; MOLECULAR BEAM EPITAXY; MONTE CARLO METHODS; MORPHOLOGY; PHASE TRANSITIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; RELAXATION PROCESSES; SEMICONDUCTING SILICON; SINGLE CRYSTALS;

EID: 0032655920     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00176-4     Document Type: Article
Times cited : (7)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.