Investigation of surface polymerization on silicon exposed to C4F8 helicon wave plasmas

Thin Solid Films

Volumn 341, Issue 1, 1999, Pages 184-187

  Lee, Weon Jeong ^a   Kim, Hyeon Soo ^a   Yeom, Geun Young ^a   Baek, Jong Tae ^b  

^a Sungkyunkwan University   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL BONDS; COMPOSITION; ELECTRIC POTENTIAL; ELLIPSOMETRY; PLASMA ETCHING; POLYMERIZATION; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR PLASMAS; X RAY PHOTOELECTRON SPECTROSCOPY;

BIAS VOLTAGE; CARBON BONDS; HELICON WAVE PLASMAS; SILICON OXIDE; SPECTROSCOPIC ELLIPSOMETRY;

SILICON WAFERS;

EID: 0032655165     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01549-1     Document Type: Article

References (10)

1. Singer P. Semicon. Int. 1997;109.
2. Horiike Y., Kubota K., Shindo H., Fukasawa T. J. Vac. Sci. Technol. A. 13:1995;801.
3. Fukasawa T., Kubota K., Shindo H., Horiike Y. Jpn. J. Phys. 33:1994;7042.
4. Kubota K., Matsumoto H., Shindo H., Shingubara S., Horiike Y. Jpn. J. Appl. Phys. 34:1995;2119.
5. Kim H.S., Nam W.J., Yeom G.Y., Lee H.J., Kim J.H., Whang K.W. J. Vac. Sci. Technol. A. 14:1996;1062.
6. Nam W.J., Yeom G.Y., Kim J.H., Whang K.W., Yoon J.K. J. Vac. Sci. Technol. A. 15:1997;590.
7. Samukawa S. Jpn. J. Appl. Phys. 32:1993;6080.
8. Tezuka Y., Kitano N., Nakano N. J. Electrochem. Soc. 142:1995;3569.
9. Oehrlein G.S., Zhang Y., Vender D., Haverlag M. J. Vac. Sci.Technol. A. 12:1994;323.
10. Rueger N.R., Beulens J.J., Schaepkens M., Doemling M.F., Mirza J.M., Standaert T.E.F.M., Oehrlein G.S. J. Vac. Sci. Technol. A. 15:1997;1881.