Deposition of high photo-conductivity a-Si:H film using ICPs without substrate heating

IEEE International Conference on Plasma Science

Volumn , Issue , 1996, Pages 96-97

  Goto, M ^a   Toyoda, H ^a   Kitagawa, M ^a   Hirao, T ^a   Sugai, H ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; DEPOSITION; PHOTOCONDUCTIVITY; PLASMA DENSITY; PLASMA OSCILLATIONS; PLASMAS; SILANES;

CAPACITIVELY COUPLED PLASMAS; GLOW DISCHARGE DECOMPOSITION; INDUCTIVELY COUPLED PLASMAS; PYREX TUBE;

AMORPHOUS FILMS;

EID: 0029696275     PISSN: 07309244     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)