Application of cobalt salicide in sub-quarter micron ULSI

Materials Research Society Symposium - Proceedings

Volumn 402, Issue , 1996, Pages 215-220

  Bai, G ^a   Stivers, A ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; ELECTRIC RESISTANCE; LEAKAGE CURRENTS; SEMICONDUCTING FILMS; THERMODYNAMIC STABILITY; THIN FILMS; TITANIUM; ULSI CIRCUITS;

COBALT SALICIDE; DOPANTS; SEMICONDUCTOR CHIP;

COBALT COMPOUNDS;

EID: 0029734598     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)