Structural rearrangement of SiO2 films during their growth and annealing

Journal of the Electrochemical Society

Volumn 146, Issue 6, 1999, Pages 2225-2228

  Revesz, A G ^a  

^a Revesz Associates   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; CHEMICAL BONDS; CRYSTAL ORIENTATION; FILM GROWTH; HELIUM; REFRACTIVE INDEX;

BOND ANGLES; MOLAR VOLUME; STRUCTURAL REARRANGEMENT;

SILICA;

EID: 0032631330     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391918     Document Type: Article

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