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Volumn 201, Issue , 1999, Pages 26-30
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In situ real time monitoring of thickness and composition in MBE using alpha particle energy loss
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Author keywords
[No Author keywords available]
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Indexed keywords
ALPHA PARTICLES;
FILM GROWTH;
SEMICONDUCTING FILMS;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTING INDIUM PHOSPHIDE;
THICKNESS MEASUREMENT;
ALPHA PARTICLE ENERGY LOSS (AEL) METHOD;
MOLECULAR BEAM EPITAXY;
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EID: 0032630056
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(98)01270-6 Document Type: Article |
Times cited : (3)
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References (15)
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