The applicability of implanted α-sources to thickness and stoichiometry measurements of thin films

Journal of Physics D: Applied Physics

Volumn 30, Issue 1, 1997, Pages 131-136

  Kelson, I ^a   Levy, Y ^a   Racah, D ^a   Redmard, E ^a   Beaudoin, M ^b   Pinnington, T ^b   Tiedje, T ^b   Giesen, U ^c,d  

^a TEL AVIV UNIVERSITY   (Israel)

^b UNIVERSITY OF BRITISH COLUMBIA   (Canada)

^c TRIUMF   (Canada)

^d UNIVERSITY OF ALBERTA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ALPHA PARTICLES; ELECTRIC VARIABLES MEASUREMENT; ELECTRON SPECTROSCOPY; ENERGY DISSIPATION; ION IMPLANTATION; STOICHIOMETRY; SUBSTRATES; THICKNESS MEASUREMENT;

INITIAL ENERGY; STOICHIOMETRY MEASUREMENTS;

THIN FILMS;

EID: 0031556915     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/30/1/016     Document Type: Article

References (8)

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