Dielectric planarization using Mn2O3 slurry

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1997, Pages 27-28

  Kishii, S ^a   Nakamura, K ^a   Arimoto, Y ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; CONCENTRATION (PROCESS); SEMICONDUCTING MANGANESE COMPOUNDS; SLURRIES;

DIELECTRIC PLANARIZATION;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0030655034     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)