Wide feature dielectric planarization using MnO2 slurry

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1996, Pages 74-75

  Kishii, S ^a   Nakamura, K ^a   Ohishi, A ^a   Okui, Y ^a   Suzuki, R ^a   Arimoto, Y ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; MANGANESE COMPOUNDS; OXIDATION; POLISHING; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SILICA; SLURRIES;

DIELECTRIC PLANARIZATION; DIELECTRIC REMOVAL; MANGANESE DIOXIDE;

ELECTRIC CONNECTORS;

EID: 0029707038     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)